Awarded contract
Published
Dry-etching equipment
82 Suppliers have already viewed this notice
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Value
299,116 EUR
Current supplier
Sentech Instruments GMBH
Description
L’objet de ce marché concerne l’acquisition, la livraison et la mise en service d’un dispositif de gravure ionique réactive par technique plasma ICP-RIE (Inductively Coupled Plasma) utilisant des gaz fluorés et son raccordement aux servitudes et gaz. Ce réacteur sera dédié à la gravure du silicium, d’autres matériaux de la colonne IV (germanium, diamant…) des oxydes et des diélectriques. Le dispositif devra permettre de réaliser des gravures dans une gamme minimale de température allant de -20 ºC à +80 ºC. Il s'agira de l'acquisition, la livraison, l'installation et la mise en service d’un dispositif de gravure ionique réactive par technique plasma ICP-RIE (Inductively Coupled Plasma) utilisant des gaz fluorés.
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