Laboratory, optical and precision equipments (excl. glasses)

Description

DTU Nanotech seeks a combined solvent and lithographic resist processing, thermal and RF sput-ter system, and fine-grained controllable plasma-based etching system housed completely within a sealed environment and permitting repeated transfer of oxygen and moisture sensitive samples be-tween multiple application of these different processing steps without exposure to the ambient en-vironment, permitting the handling and fabrication of 2D materials and van der Waals heterostruc-tures based prototype electronic and optical devices. These devices are to be free of ambient at-mosphere-induced contamination or degradation. In collaboration with Moorfield Ltd. Such a system has been specified, incorporating Moorfield’s Soft-Etch technology (developed with the world’s leading 2D materials research groups in Man-chester, UK) with plasma power setpoint control down to the 10mW range for a 30W plasma, and incorporating feedback from DTU Nanotech on system layout. DTU Nanotech seeks a combined solvent and lithographic resist processing, thermal and RF sput-ter system, and fine-grained controllable plasma-based etching system housed completely within a sealed environment and permitting repeated transfer of oxygen and moisture sensitive samples be-tween multiple application of these different processing steps without exposure to the ambient en-vironment, permitting the handling and fabrication of 2D materials and van der Waals heterostruc-tures based prototype electronic and optical devices. These devices are to be free of ambient at-mosphere-induced contamination or degradation. In collaboration with Moorfield Ltd. Such a system has been specified, incorporating Moorfield’s Soft-Etch technology (developed with the world’s leading 2D materials research groups in Man-chester, UK) with plasma power setpoint control down to the 10mW range for a 30W plasma, and incorporating feedback from DTU Nanotech on system layout.