Measuring instruments

Description

High Resolution X-Ray Diffractometer for user in clean room facility. The main applications will be measurements of thin films grown by different CVD techniques. The materials for measurement range from single crystalline to polycrystalline layers of many different materials such as Si, C, III-V materials and more. Measurement of film thickness, crystallinity, roughness crystal quality are needed. High Resolution X-Ray Diffractometer for user in clean room facility. The main applications will be measurements of thin films grown by different CVD techniques. The materials for measurement range from single crystalline to polycrystalline layers of many different materials such as Si, C, III-V materials and more. Measurement of film thickness, crystallinity, roughness crystal quality are needed. In our cleanroom environment, it is crucial that we keep our samples clean and free from contamination. This must be considered through all processing and characterization steps. Measuring with XRD will be done between process steps and hence there cannot be used any kind of sticking material such as glue or tape on the samples as this will contaminate the samples. In some test samples, we have seen strong indication that a vacuum chuck introduces some stress to the sample limiting the measurement quality. It should also be mentioned that we have samples of odd sizes between 2 mm by 2 mm up to a diameter of 150 mm. For these reasons the Rigaku SmartLab with unique In-Plane arm, making it possible to do measurements without tilting samples, is the only solution that satisfies our needs.