Supply and Commissioning of a Magnetron Sputter Deposition Tool

Description

Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4” wafer area. The deposition should also be conformal to features present on the wafers. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility. Lot 1: This procurement is for the supply and commissioning of a Magnetron Sputter Deposition Tool. The Institute of Photonics is seeking to complement their cleanroom micro-fabrication facility equipment with an argon-based magnetron sputtering system for contacting semiconductor light-emitting devices, based on Gallium Nitride (as an example), using the sequential deposition of metals onto a wafer area of up to four inches (platen size). The system is primarily destined to be employed for academic research. It is purposed to be a downgrade from existing industrial-scale legacy equipment. The current legacy equipment was inherited by the department during the closure of a university department. There have been issues with the availability of spare parts for the legacy equipment. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility. Further details of requirements are detailed in the Specification of Requirements.