Magnetron Sputtering Devices

Description

DTU would like to purchase a magnetron sputtering devices for producing thing films of various ma-terials, but primarily metals or metal alloys. The setup will be used by academic researchers inves-tigating catalysts. The Sputtering system must be able to: • Achieve ultra-high vacuum base pressures. • Sputter clean substrates • Sputter deposit onto samples up to 4” in diameter • Ability to take in SHOM flag style sample holders and accompanying samples, and sputter deposit onto these samples • Have the potential to connect with an Ultra-High Vacuum (UHV) Linear Transfer System (LTS) allowing SHOM flag style sample holders and accompanying samples to be moved between the LTS and sputter deposition chamber. The system should be able to allow for samples produced in the sputter deposition chamber to be transferred to the LTS allowing these samples then to be moved to other equipment attached to the LTS where they can be tested or characterized all without being exposed to air.